I-CVD (i-Chemical Vapor Deposition) idayimani yimathiriyeli yedayimani yokwenziwa eveliswe yinkqubo yokusabela kweekhemikhali phakathi kwegesi kunye nomphezulu we-substrate phantsi kobushushu obuphezulu kunye noxinzelelo.Idayimani ye-CVD isetyenziswa kwiintlobo ngeentlobo zezicelo ezibandakanya izixhobo zokusika, iingubo zokunxiba, i-electronics, izinto zokwakha kunye nokufakelwa kwe-biomedical.Olunye uncedo lwedayimani ye-CVD kukuba iimilo ezintsonkothileyo kunye nobukhulu bunokuveliswa ngokwemiqulu ephezulu, nto leyo eyenza ibe yimathiriyeli eguquguqukayo kumashishini ahlukeneyo.Ukongeza, idayimani ye-CVD ine-conductivity ephezulu ye-thermal, ukuqina kunye nokuqina, okwenza kube yinto efanelekileyo kwizicelo eziphezulu zokusebenza.Nangona kunjalo, enye into engalunganga yedayimani ye-CVD kukuba iyabiza kakhulu xa ithelekiswa nedayimane yendalo kunye nezinye izinto, ezinokunciphisa ukwamkelwa kwayo ngokubanzi.